Mask Shot Count Reduction Strategies in the OPC FlowWORD, James; MIZUUCHI, Keisuke; SAI FU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283F.1-70283F.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Comparison of OPC models with and without 3D-mask effectSER, Jung-Hoon; PARK, Tae-Hoon; JEONG, Moon-Gyu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401T.1-76401T.6, 2Conference Paper

Implementation of Multiple ROI with single FOV for advanced mask metrologyJEONG, Kyu-Hwa; FREZGHI, Hatsey; TAVASSOLI, Malahat et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72724D.1-72724D.9, 2Conference Paper

Enhancing OPC Model Stability and Predictability Using SEM Image ContoursEL-DIN HABIB, Mohamed Serag.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 712244.1-712244.9, 2Conference Paper

Physical Simulation for Verification and OPC on Full Chip LevelSHIM, Seongbo; MOON, Seongho; KIM, Youngchang et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732I.1-79732I.9, 2Conference Paper

Cell-Based OPC with Standard-Cell Fill InsertionLIANG DENG; CHAO, Kai-Yuan; HUA XIANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69251L.1-69251L.8, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Flexible sparse and dense OPC algorithmsCOBB, Nick.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 2, 693-702Conference Paper

Efficient approach to improving pattern fidelity with multi OPC model and recipeDO, Munhoe; KANG, Jaehyun; CHOI, Jaeyoung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63494P.1-63494P.12, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

eMET: 50keV electron multibeam Mask Exposure ToolKLEIN, Christof; KLIKOVITS, Jan; LOESCHNER, Hans et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700C.1-79700C.6Conference Paper

Library-based performance-based OPCTEH, Siew-Hong; HENG, Chun-Huat; TAY, Arthur et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 76410X.1-76410X.10Conference Paper

SEM contour-based Model OPC calibrated with Optically sensitive patternsJUNG, Jee-Eun; LEE, Mi-Kyeong; CHO, Yong-Jin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692516.1-692516.10, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

SEM-Contour Based Mask ModelingVASEK, Jim; TEJNIL, Edita; KUSNADI, Ir et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244Q.1-69244Q.11, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Inverse lithography technology at chip scaleLIN, Benjamin; MING FENG SHIEH; LINYONG PANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 1, 615414.1-615414.11Conference Paper

A fresh look at the cell-wise process effect correctionsLAPANIK, Dmitri.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63491R.1-63491R.7, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

A novel GDSII compression techniquePEREIRA, Mark; BARUAH, Barsha.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 2, 59923N.1-59923N.8Conference Paper

E-beam Shot Count Estimation at 32 nm HP and BeyondCHOI, Jin; SANG HEE LEE; NAM, Dongseok et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737917.1-737917.9Conference Paper

Empirical study of OPC metrology requirements for 32-nm node logicWARD, Brian S; ZAVYLOVA, Lena; DE BISSCHOP, Peter et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 712242.1-712242.10, 2Conference Paper

Evaluation of OPC Test Patterns using Parameter SensitivityWARD, Brian S.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243S.1-69243S.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Optimal Photomask Printability using Interactive OPC with a New Calibration MethodologyBAROUCH, Eytan; KNODLE, Stephen L.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66071P.1-66071P.8, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Scanner-characteristics-aware OPC modeling and correctionTYMINSKI, Jacek K; QIAOLIN ZHANG; LUCAS, Kevin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210Z.1-65210Z.13, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Shot based MRC flow by using full chip MRC toolJI, Min-Kyu; JANG, Sung-Hoon; SON, Sung-Jun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66070V.1-66070V.11, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Fractal model applied wavefront aberration for the expression of local flareNAKASHIMA, Toshiharu; OGATA, Taro.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 615433.1-615433.10Conference Paper

Use of scatterometry for scanner matchingBALD, Holger; SELTMANN, Rolf; BUBKE, Karsten et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7985, issn 0277-786X, isbn 978-0-8194-8553-3, 79850J.1-79850J.11Conference Paper

A New Etch-Aware After Development Inspection (ADI) Technique for OPC ModelingJING XUE; HUANG, Jason; KAZARIAN, Aram et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76402Q.1-76402Q.8, 2Conference Paper

Exposure Tool Specific Post-OPC VerificationSTURTEVANT, John; JAYARAM, Srividya; HONG, Le et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69250T.1-69250T.9, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper